Photosensitive resin composition for volume phase hologram...

Details Photosensitive resin composition for volume phase hologram... Photosensitive resin composition for volume phase hologram...

2006-03-01

2011-10-11

Angebranndt, Martin (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Holographic process, composition, or product

C430S002000, C430S280100, C359S003000

Reexamination Certificate

active

08034514

ABSTRACT:
The present invention relates to a volume phase hologram recording material excellent in transparency, sensitivity, low curing shrinkage, and transparency, a volume phase hologram recording medium, and a volume phase hologram. A photosensitive resin composition for volume phase hologram recording contains a low-molecular-weight solvent-soluble aromatic copolymer (A) having a structural unit of a divinyl aromatic compound and a structural unit of a monovinyl aromatic compound, a photoradical polymerizable compound (B) which is copolymerizable with the soluble aromatic copolymer (A), and a photopolymerization initiator (C) as essential components. The photosensitive resin composition further contains, one kind or more of a polymer binder (D) and a plasticizer (E), and the soluble aromatic copolymer (A) is incorporated in an amount of 5 to 60% by weight.

REFERENCES:
patent: 3993485 (1976-11-01), Chandross et al.
patent: 5759721 (1998-06-01), Dhal et al.
patent: 5830621 (1998-11-01), Suzuki et al.
patent: 5874187 (1999-02-01), Colvin et al.
patent: 6124076 (2000-09-01), Dhar et al.
patent: 6784300 (2004-08-01), Cetin et al.
patent: 7402645 (2008-07-01), Kawabe
patent: 7582231 (2009-09-01), Foulger et al.
patent: 7595362 (2009-09-01), Kawabe et al.
patent: 2005/0058910 (2005-03-01), Takizawa et al.
patent: 2006/0177666 (2006-08-01), Kawabe
patent: 2009/0130568 (2009-05-01), Tomari et al.
patent: 2010/0203429 (2010-08-01), Tomari et al.
patent: 05-094014 (1993-04-01), None
patent: 09-106242 (1997-04-01), None
patent: 2000-086914 (2000-03-01), None
patent: 2004-123873 (2004-04-01), None
patent: WO-03/081344 (2003-10-01), None
Antonettitet al. “Self-diffusion of polystyrene chains in networks”, Macromol. 18(6) pp. 1162-1166 (1985).
Sasa et al. “A novel UV-sensitive photopolymerization system with microgel matrix”, Poly. Adv. Technol. vol. 5 pp. 98-104 (1994).
Sasa et al. “Photopolymerization system with microgel matrix: application to visible laser recording materials and effects . . . ”, Chem. Mater., vol. 5(10) pp. 1434-1438 (1993).
Sasa et al., “Surface activated photopolymer microgels” Adv. Mater., vol. 6(5) pp. 417-421 (May 1994).
International Preliminary Report on Patentability dated Aug. 12, 2008, issued on PCT/JP2006/303832 (2 pages).
Written Opinion of the International Searching Authority, issued on PCT/JP2006/303832 (4 pages).
Notification Concerning Transmittal of International Preliminary Report on Patentability, Sep. 2007.

Affiliated with

Also associated with

Rating

Photosensitive resin composition for volume phase hologram... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin composition for volume phase hologram..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition for volume phase hologram... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4277534