System for specifying equipment causing failure

Details System for specifying equipment causing failure System for specifying equipment causing failure

2007-04-24

2011-10-18

Nguyen, Tu (Department: 2886)

Image analysis

Applications

Manufacturing or product inspection

Reexamination Certificate

active

08041100

ABSTRACT:
A first defect distribution superimposed image is formed by superimposing defect distributions on individual substrates processed by a causal equipment unit candidate on one another. Second defect distribution superimposed images are formed by superimposing, on one another, defect distributions on individual substrates processed by equipment units other than the causal equipment unit candidate in one same step as that executed by the causal equipment unit candidate. The first defect distribution superimposed image and the second defect distribution superimposed images are displayed in contrast on one display screen.

REFERENCES:
patent: 7433508 (2008-10-01), Sakai et al.
patent: 7813539 (2010-10-01), Shibuya et al.
patent: 10-326816 (1998-12-01), None
patent: 11-045919 (1999-02-01), None
patent: 2005-197629 (2005-07-01), None
patent: 2005-346596 (2005-12-01), None
International Search Report, Jun. 12, 2007, issued in PCT/JP2007/058832.

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