Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-06-14

2011-10-25

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S442110, C359S642000, C359S811000, C359S819000

Reexamination Certificate

active

08044373

ABSTRACT:
A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.

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