Substrate treatment apparatus

Details Substrate treatment apparatus Substrate treatment apparatus

2008-04-24

2011-11-08

Nguyen, Dung Van (Department: 3723)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S088300

Reexamination Certificate

active

08051522

ABSTRACT:
The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with respect to a longitudinal axis thereof extending perpendicularly to a front surface of the substrate held by the substrate holding mechanism, brush moving mechanism which moves the brush along the longitudinal axis and along a lateral axis orthogonal to the longitudinal axis, load detecting unit which detects a load applied along the longitudinal axis to the brush, and first judging unit which judges, based on an output of the load detecting unit, whether or not the brush is located at a reference position serving as a reference for guiding the brush to a treatment position at which the brush is located in the cleaning process.

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Korean Office Action (Notice of Allowance) dated Nov. 28, 2009 in corresponding Korean Patent Application No. 10-2008-0035969.

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