Semiconductor device that is advantageous in operational...

Static information storage and retrieval – Floating gate – Particular connection

Reexamination Certificate

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C365S185260, C365S185270, C365S185280

Reexamination Certificate

active

08045379

ABSTRACT:
A semiconductor device includes an N-type insulated-gate field-effect transistor including a first insulating layer that is provided along side walls of a gate electrode, has a negative thermal expansion coefficient, and applies a tensile stress to a channel region of the N-type insulated-gate field-effect transistor. The device also includes a P-type insulated-gate field-effect transistor including a second insulating layer that is provided along side walls of a gate electrode, has a positive thermal expansion coefficient, and applies a compression stress to a channel region of the P-type insulated-gate field-effect transistor.

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