Method for using a topcoat composition

Details Method for using a topcoat composition Method for using a topcoat composition

Filed on

2008-12-17

Date issued

2011-11-08

Examiner

Mulcahy, Peter D. (Department: 1764)

Patent Class

Synthetic resins or natural rubbers -- part of the class 520 ser

SubClass

Synthetic resins

SubSubClass

Polymers from only ethylenic monomers or processes of...

Other Related Categories

C430S270100, C526S247000, C526S319000

Type

Reexamination Certificate

Status

active

Patent number

08053537

Description

ABSTRACT:
A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

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