Photomask blank, photomask, and methods of manufacturing the...

Details Photomask blank, photomask, and methods of manufacturing the... Photomask blank, photomask, and methods of manufacturing the...

2009-09-18

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048594

ABSTRACT:
A photomask blank is for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. The phase shift part is a dug-down part formed by digging down the light-transmissive substrate from a surface thereof to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through the light-transmissive substrate at a portion where the phase shift part is not provided. The photomask blank includes a light-shielding part formed in a peripheral area around a transfer pattern area of the surface of the light-transmissive substrate and adapted to shield exposure light and further includes an etching mask film formed in the transfer pattern area of the surface of the light-transmissive substrate and made of a material being substantially dry-etchable with a chlorine-based gas, but not substantially dry-etchable with a fluorine-based gas, the etching mask film serving as an etching mask at least until the digging depth is reached when forming the dug-down part.

REFERENCES:
patent: 2003/0203290 (2003-10-01), Misaka
patent: 2006/0177746 (2006-08-01), Yoshikawa et al.
patent: 2007/0212618 (2007-09-01), Yoshikawa et al.
patent: 2007-241065 (2007-09-01), None
patent: 2007-241136 (2007-09-01), None

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