Measuring and testing – With fluid pressure
Reexamination Certificate
2009-04-07
2011-12-06
Noori, Max (Department: 2855)
Measuring and testing
With fluid pressure
Reexamination Certificate
active
08069704
ABSTRACT:
A gate valve corresponding to the sealing structure seals an opening of a plasma generation chamber and includes a valve body, a valve stem, and ring-shaped first and second sealing members that seal a gap between the valve body and the plasma generation chamber. The first ring-shaped sealing member is on the side of the plasma generation chamber and is exposed to a plasma atmosphere. The first and second ring-shaped sealing members do not contact each other, that is, a gap is formed therebetween. A plurality of gas grooves are arranged in the length direction of the first ring-shaped sealing member. The gas grooves are formed by cutting the valve body in a direction almost perpendicular to the length direction of the first ring-shaped sealing member, and the gap is in communication with the plasma generation chamber via the gas grooves. A gas injection passage14for injecting a gas into the gap is formed in the wall of the plasma generation chamber. A concave portion extending along the length direction of the first ring-shaped sealing member is formed on the surface of the plasma generation chamber, and the concave portion is connected to a gas outlet of the gas injection passage.
REFERENCES:
patent: 6962348 (2005-11-01), Fink
patent: 7930992 (2011-04-01), Nozawa et al.
patent: 2006/0054280 (2006-03-01), Jang
patent: 2006/0055014 (2006-03-01), Tsurume et al.
patent: 2008/0000530 (2008-01-01), Sun et al.
patent: 2008/0302761 (2008-12-01), Hirayama et al.
patent: 61-192339 (1986-08-01), None
patent: 06-112168 (1994-04-01), None
patent: 2000-182958 (2000-06-01), None
patent: 2004-099924 (2004-04-01), None
patent: 2004-141803 (2004-05-01), None
Notice of Preliminary Rejection issued by Korean Patent Office on Jan. 11, 2011, citing JP61-192339 and US6,962,348.
Ishibashi Kiyotaka
Kishida Yoshiharu
Cantor & Colburn LLP
Noori Max
Tokyo Electron Limited
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