Method of preparing drawing data for charged beam exposure syste

Details Method of preparing drawing data for charged beam exposure syste Method of preparing drawing data for charged beam exposure syste

1988-12-01

1991-04-16

Lall, Parshotam S.

Boots, shoes, and leggings

364489, 364488, 2504922B, 250398, 250396R, G06F 1560, G06F 1520

Patent

active

050088300

ABSTRACT:
A method of preparing drawing data for a charged beam exposure system includes: constructing, from pattern data having a multiple hierarchical structure, reiterative units disposed in an array without any gap formed therebetween; converting the pattern data into first figure processing data including a total figure and reiterative units within the total area; dividing the total area of the first figure into equal area processing data fields for a charged beam exposure system, each field including a whole number of reiterative units, if any, thereby producing second figure processing data; performing figure modification processing with respect to features in a field outside reiterative units in the field and separately with respect to the reiterative units within the field, thereby producing third figure processing data; and converting the third figure processing data into suitable drawing data for the charged beam exposure system.

REFERENCES:
patent: 4409686 (1983-10-01), Ports et al.
patent: 4482810 (1984-11-01), Cooke
patent: 4531191 (1985-07-01), Koyama
patent: 4613940 (1986-09-01), Shenton et al.
patent: 4789945 (1988-12-01), Niijima
patent: 4820928 (1989-04-01), Ooyama et al.
patent: 4833621 (1989-05-01), Umatate
patent: 4878177 (1989-10-01), Ikenaga et al.
patent: 4890238 (1989-12-01), Klein et al.
Koyama et al., "Hierarchical Data . . . System EX-7", First Micro Process Conference, 1988, pp. 28-29.

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