Method and system for obtaining bounds on process parameters...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

08059884

ABSTRACT:
Embodiments of the present invention provide a method of performing printability verification of a mask layout. The method includes creating one or more tight clusters; computing a set of process parameters associated with a point on said mask; comparing said set of process parameters to said one or more tight clusters; and reporting an error when at least one of said process parameters is away from said one or more tight clusters.

REFERENCES:
patent: 5208124 (1993-05-01), Sporon-Fiedler et al.
patent: 6602728 (2003-08-01), Liebmann et al.
patent: 6649309 (2003-11-01), Mukherjee
patent: 6709793 (2004-03-01), Brankner et al.
patent: 6928636 (2005-08-01), Ohnuma
patent: 6934929 (2005-08-01), Brist et al.
patent: 6967710 (2005-11-01), Shiraishi
patent: 7065738 (2006-06-01), Kim
patent: 7127699 (2006-10-01), Gallatin et al.
patent: 7266800 (2007-09-01), Sezginer
patent: 2005/0210437 (2005-09-01), Shi et al.
patent: 2007/0061772 (2007-03-01), Ye et al.
International Search Report and Written Opinion—Intern'l filing date—April 23, 2008 PCT/US2008/061196.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for obtaining bounds on process parameters... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for obtaining bounds on process parameters..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for obtaining bounds on process parameters... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4261320

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.