Exposure apparatus, image forming apparatus and heating method

Details Exposure apparatus, image forming apparatus and heating method Exposure apparatus, image forming apparatus and heating method

2008-01-29

2011-11-15

Pham, Hai C (Department: 2861)

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C347S238000, C347S256000

Reexamination Certificate

active

08059147

ABSTRACT:
The exposure apparatus is provided with: a substrate; plural light emitting elements that are arranged in a line on a first surface of the substrate; and a heating unit that heats the substrate from the first surface side.

REFERENCES:
patent: 6266074 (2001-07-01), Koumura et al.
patent: 7108399 (2006-09-01), Miyawaki et al.
patent: 7679635 (2010-03-01), Taira et al.
patent: 2002-370400 (2002-12-01), None

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