Optical: systems and elements – Lens – With light limiting or controlling means
Reexamination Certificate
2010-05-07
2011-11-01
Sugarman, Scott J (Department: 2873)
Optical: systems and elements
Lens
With light limiting or controlling means
C359S649000
Reexamination Certificate
active
08049973
ABSTRACT:
In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.
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U.S. Appl. No. 61/219,823, filed Jun. 24, 2009.
Carl Zeiss SMT GmbH
Fish & Richardson P.C.
Sugarman Scott J
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