Processing apparatus and atmosphere exchange method

Details Processing apparatus and atmosphere exchange method Processing apparatus and atmosphere exchange method

2008-03-28

2011-12-20

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Apparatus

With heating, cooling or heat exchange means

Reexamination Certificate

active

08079375

ABSTRACT:
A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.

REFERENCES:
patent: 6177661 (2001-01-01), Lee et al.
patent: 6805751 (2004-10-01), Allen
patent: 2006/0066834 (2006-03-01), Phillips et al.
patent: 2006/0291982 (2006-12-01), Tanaka
patent: 2886521 (1998-06-01), None
patent: 11-345771 (1999-12-01), None
patent: 11-345771 (1999-12-01), None
patent: 2003-168712 (2003-06-01), None
Okuyama et al., “New System Chemical Engineering, Fine Particles Engineering,” pp. 106-107, May 1992 Ohmusha Publishing (with English translation).

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