Method of forming a uniform color filter array

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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Details

C438S029000, C438S034000, C438S035000, C438S069000, C257SE31121, C257SE31127, C348S273000, C349S106000

Reexamination Certificate

active

08071416

ABSTRACT:
A method of forming a uniform color filter array. In one embodiment, a first compensation layer is formed over a non-planar color filter array and is patterned to form material structures. A second compensation layer is blanket deposited over the first layer. A technique, such as etching or polishing, is then performed to remove the first and second compensation layers, creating a substantially planar color filter array surface. In another embodiment, the planar color filter array is formed in a recessed trench.

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