Adjustable electrodes and coils for plasma density...

Electric heating – Metal heating – By arc

Reexamination Certificate

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C219S121430, C219S121520, C156S345470, C156S345340, C118S7230IR

Reexamination Certificate

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07829815

ABSTRACT:
A adjustable upper coil or electrode for a reaction chamber apparatus useable in semiconductor processing, is constructed so that its shape may be selectively changed or so at least two portions thereof may be selectively driven at different power and/or frequencies. The adjustable upper coil or electrode, therefore, enables the plasma density distribution in the reaction chamber apparatus to be selectively controlled.

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Taiwanese Office Action dated Apr. 28, 2010.
Chinese Office Action dated Jun. 1, 2010.
TW Office Action issued Jul. 30, 2010.

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