Method for manufacturing metal-insulator-metal capacitor

Metal working – Electric condenser making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C029S025420, C029S830000, C029S846000

Reexamination Certificate

active

07823260

ABSTRACT:
A method of manufacturing a metal-insulator-metal (MIM) capacitor that includes at least one of the following steps: Sequentially forming a bottom metal film, an insulating film, and a top metal film over a wafer. Forming a first pattern for etching the top metal film and the insulating film. Etching the top metal film and the insulating film, using the formed first pattern, and then stripping the first pattern. Conducting a heat treatment and a cooling split for the wafer. Forming a metal pattern for etching the bottom metal film. Etching the bottom metal film, using the formed metal pattern, and then stripping the metal pattern.

REFERENCES:
patent: 5994207 (1999-11-01), Henley et al.
patent: 6291313 (2001-09-01), Henley et al.
patent: 6548382 (2003-04-01), Henley et al.
patent: 6890838 (2005-05-01), Henley et al.
patent: 7435613 (2008-10-01), Barber et al.
patent: 2002/0115230 (2002-08-01), Barber et al.
patent: 2005/0070071 (2005-03-01), Henley et al.
patent: 2009/0049670 (2009-02-01), Barber et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing metal-insulator-metal capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing metal-insulator-metal capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing metal-insulator-metal capacitor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4245485

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.