Interferometric method for improving the resolution of a...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C359S577000

Reexamination Certificate

active

07859646

ABSTRACT:
According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.

REFERENCES:
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patent: 2006/0170896 (2006-08-01), Markoya et al.
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Kok, Pieter et al., Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns, Physical Review A, vol. 63, pp. 063407 1-8 (2000).
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