Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2008-06-30
2010-06-29
Ngo, Ngan (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257SE23180
Reexamination Certificate
active
07745936
ABSTRACT:
A semiconductor integrated circuit device includes a substrate having a PROM formed thereon in which the data memory state of the PROM is changed by the irradiation of light, and a multilayer wiring structure formed on the same side of the substrate as the PROM is formed. The multilayer wiring structure includes a transparent area, a shield area, and a PAD portion. The transparent area is formed from transparent material at a position opposite to the PROM area where the PROM is formed, and used as a light guiding path from the outside of the multilayer wiring structure to the PROM. The shield area is formed continuously from shielding materials arranged in several layers in the periphery of the transparent area. The PAD portion is formed on the outside of the shield area in regard to the transparent area, and controls the memory state of the PROM.
REFERENCES:
patent: 2007/0222043 (2007-09-01), Watanabe et al.
patent: 5-38915 (1993-05-01), None
patent: 7-66378 (1995-03-01), None
patent: 2003-124363 (2003-04-01), None
patent: 2006-154217 (2006-06-01), None
patent: 2006-154317 (2006-06-01), None
NEC Electronics Corporation
Ngo Ngan
Trinh Hoa B
Young & Thompson
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