Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-08-20
2010-11-09
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
07829247
ABSTRACT:
A photomask includes a transparent mask substrate, and a plurality of square mask cells provided on the mask substrate. Each mask cell includes at least one of a light transmitting region and a light shielding region. A planar region (in which the mask cells are formed) of the mask substrate includes a first region, a second region surrounding the first region, and a third region outside the second region. The first region includes a first group of mask cells transmitting lights of a first light intensity greater than zero and less than or equal to 1. The second region includes a second group of mask cells transmitting lights of a second light intensity greater than zero and less than the first light intensity. The third region includes a third group of mask cells transmitting lights of a third light intensity greater than or equal to zero and less than the second light intensity.
REFERENCES:
patent: 2005/0130045 (2005-06-01), Ozawa
patent: 3117886 (1996-06-01), None
patent: 2002-124568 (2002-04-01), None
Alam Rashid
Oki Semiconductor Co., Ltd.
Rabin & Berdo PC
Rosasco Stephen
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