Semiconductor manufacturing apparatus and method thereof

Details Semiconductor manufacturing apparatus and method thereof Semiconductor manufacturing apparatus and method thereof

2006-04-27

2010-12-07

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C700S121000, C438S795000, C430S296000, C430S269000

Reexamination Certificate

active

07847270

ABSTRACT:
According to the present invention, there is provided a semiconductor manufacturing apparatus having:a process flow information creating section which registers an exposure device as a device for performing the pattern writing processing and an electron beam direct writing device as an alternative to the exposure device, when creating process flow information by sequentially registering processing conditions of processings in a semiconductor manufacturing process; anda control section which searches for information on the pattern writing processing based on the process flow information before the pattern writing processing, determines whether or not a mask used by the exposure device for performing the pattern writing processing searched for is installed in the exposure device, and sets the exposure device to perform the pattern writing processing in the case where it has been determined that the mask is installed in the exposure device, or sets the electron beam direct writing device to perform the pattern writing processing in the case where it has been determined that the mask is not installed in the exposure device.

REFERENCES:
patent: 6232612 (2001-05-01), Nakajima
patent: 2005/0177268 (2005-08-01), Morinaga et al.
patent: 03-238808 (1991-10-01), None
patent: 11-040475 (1999-02-01), None

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