Process for formation of three-dimensional photonic crystal

Details Process for formation of three-dimensional photonic crystal Process for formation of three-dimensional photonic crystal

2007-02-07

2010-06-01

Olsen, Allan (Department: 1716)

Etching a substrate: processes

Forming or treating optical article

C216S046000, C216S067000, C385S129000

Reexamination Certificate

active

07727410

ABSTRACT:
A process for forming a three-dimensional photonic crystal comprises the steps of providing a base material having a first face and a second face adjoining to each other at a first angle, forming a first mask on the first face, dry-etching the first face in a direction at a second angle to the first face to remove a portion of the base material not protected by the first mask, forming a second mask on the second face, and dry-etching the second face in a direction at a third angle to the second face to remove a portion of the base material not protected by the second mask.

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