Photosensitive lithographic printing plate containing a two-equi

Details Photosensitive lithographic printing plate containing a two-equi Photosensitive lithographic printing plate containing a two-equi

1995-03-07

1996-12-10

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430170, 430180, 430181, 430182, 430189, 4302751, 4302781, 430300, 430302, 430145, 430154, G03C 152

Patent

active

055829520

ABSTRACT:
A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline developer (pH 12.5 or less) is disclosed. The photosensitive lithographic printing plate comprises a support and a photosensitive layer provided thereon, wherein the photosensitive layer is formed from a photosensitive composition containing at least a two-equivalent coupler residue-containing compound and a photosensitive compound or a photosensitive mixture acting as a positive type.

REFERENCES:
patent: 4642283 (1987-02-01), Takahashi et al.
patent: 5225309 (1993-07-01), Suzuti et al.

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