In situ, ex situ and inline process monitoring, optimization...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed

Reexamination Certificate

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C438S010000, C324S071500

Reexamination Certificate

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07816152

ABSTRACT:
Methods and systems for in situ process control, monitoring, optimization and fabrication of devices and components on semiconductor and related material substrates includes a light illumination system and electrical probe circuitry. The light illumination system may include a light source and detectors to measure optical properties of the in situ substrate while the electrical probe circuitry causes one or more process steps due to applied levels of voltage or current signals. The electrical probe circuitry may measure changes in electrical properties of the substrate due to the light illumination, the applied voltages and/or currents or other processes. The in situ process may be controlled on the basis of the optical and electrical measurements.

REFERENCES:
patent: 6166354 (2000-12-01), Hause et al.
patent: 6656749 (2003-12-01), Paton et al.
patent: 6812045 (2004-11-01), Nikoonahad et al.
patent: 7462324 (2008-12-01), Ozaki et al.
patent: 2007/0026541 (2007-02-01), Kokura

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