Optics: measuring and testing – Material strain analysis – By light interference detector
Reexamination Certificate
2007-12-14
2010-06-01
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
Material strain analysis
By light interference detector
C356S457000, C356S521000
Reexamination Certificate
active
07728958
ABSTRACT:
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.
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Attofemto, Inc.
Connolly Patrick J
Davis , Wright, Tremaine, LLP
Rondeau, Jr. George C.
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