Semiconductor laser device and method for manufacturing the...

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S043010, C372S044011, C372S045010

Reexamination Certificate

active

07656921

ABSTRACT:
A current blocking structure of a semiconductor laser includes a p-type InP buried layer, an n-type InP current blocking layer, and a p-type InP current blocking layer laminated along the mesa side surface of a ridge. In the structure, an upper end part of the n-type InP current blocking layer is covered with the p-type InP buried layer and the p-type InP current blocking layer. The n-type InP current blocking layer is prevented from contacting n-type and p-type InP cladding layers. Creation of an ineffective current path from one of the n-type InP cladding layers through the n-type InP current blocking layer to a p-type InP cladding layer of the semiconductor laser is prevented.

REFERENCES:
patent: 4758535 (1988-07-01), Sakakibara et al.
patent: 5383215 (1995-01-01), Narui et al.
patent: 5390205 (1995-02-01), Mori et al.
patent: 5596592 (1997-01-01), Tanigami et al.
patent: 5822349 (1998-10-01), Takaoka et al.
patent: 6084901 (2000-07-01), Suzuki
patent: 6333946 (2001-12-01), Miyashita et al.
patent: 6470038 (2002-10-01), Munakata et al.
patent: 6504190 (2003-01-01), Haematsu
patent: 2002/0041613 (2002-04-01), Yoshida et al.
patent: 2002/0118717 (2002-08-01), Nagashima et al.
patent: 2003/0012240 (2003-01-01), Yamamoto et al.
patent: 2003/0062517 (2003-04-01), Ryder et al.
Tsuchiya, Tomonobu, et al.; In situ Deep Etching for an InGaAlAs Buried Heterostructure by Using HCI Gas in a Metalorganic Vapor Phase Epitaxy Reactor,JP J. of Applied Physics, vol. 43, No. 10A, (2004), pp. L1247-L1249.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor laser device and method for manufacturing the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor laser device and method for manufacturing the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor laser device and method for manufacturing the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4225375

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.