Preventing substrate deformation

Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S397000, C257S059000, C257S072000, C313S504000, C313S506000

Reexamination Certificate

active

07816666

ABSTRACT:
A substrate prevented from being deformed due to thermal stress or deposition stress includes a deformation preventing layer arranged on one surface of the substrate. The substrate can include a thin film transistor arranged on one surface of the substrate and the deformation preventing layer, arranged on the another surface of the substrate, and including at least one layer.

REFERENCES:
patent: 5319479 (1994-06-01), Yamada et al.
patent: 6429053 (2002-08-01), Yamazaki et al.
patent: 6787796 (2004-09-01), Do et al.
patent: 6794277 (2004-09-01), Machida et al.
patent: 2002/0190332 (2002-12-01), Lee et al.
patent: 2003/0062519 (2003-04-01), Yamazaki et al.
patent: 2003/0077886 (2003-04-01), Machida et al.
patent: 2003/0164496 (2003-09-01), Do et al.
patent: 2004/0046173 (2004-03-01), Fukada
patent: 2004/0053431 (2004-03-01), Chang et al.
patent: 2004/0056591 (2004-03-01), Koo et al.
patent: 2005/0006768 (2005-01-01), Narasimhan et al.
patent: 2005/0206304 (2005-09-01), Kim
patent: 2006/0019573 (2006-01-01), Koo et al.
patent: 2006/0022587 (2006-02-01), Jeong et al.
patent: 2006/0043360 (2006-03-01), Kim et al.
patent: 2006/0082292 (2006-04-01), Kang et al.
patent: 2006/0097263 (2006-05-01), Lee et al.
patent: 03-179778 (1991-08-01), None
patent: 04-144170 (1992-05-01), None
patent: 11-153788 (1999-06-01), None
patent: 2002-243974 (2000-09-01), None
patent: 2002-122846 (2002-04-01), None
patent: 2002-289861 (2002-10-01), None
patent: 2003-058078 (2003-02-01), None
patent: 2004-109975 (2004-04-01), None
patent: 2005-292574 (2005-10-01), None
Office Actionfrom the Japanese Patent Office issued in Applicant's corresponding Japanese Patent Application No. 2005-223203 dated Jul. 29, 2008.
Office action from the Japanese Patent office issued in Applicant's corresponding Japanese Patent Application No. 2005-223203 dated Nov. 26, 2008.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Preventing substrate deformation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Preventing substrate deformation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preventing substrate deformation will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4224829

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.