Lithographic mask alignment

Details Lithographic mask alignment Lithographic mask alignment

2004-10-07

2010-02-02

Ewald, Maria Veronica D (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Preform reshaping or resizing means: or vulcanizing means...

Surface deformation means only

C356S490000, C264S293000

Reexamination Certificate

active

07654816

ABSTRACT:
Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement of at least one of the substrate and the lithographic mask into mutual alignment.

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patent: 2002-335062 (2002-11-01), None
patent: WO 02/067055 (2002-08-01), None
Patent Abstracts of Japan—Method for Manufacturing Printed Circuit Board—vol. 2003 No. 03—May 5, 2003—Mitsubishi Paper Mills Ltd .

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