Method of cleaning semiconductor surfaces

Details Method of cleaning semiconductor surfaces Method of cleaning semiconductor surfaces

2006-11-28

2010-02-02

Cleveland, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

C134S001300, C438S906000

Reexamination Certificate

active

07655095

ABSTRACT:
Devices and methods of cleaning are described. The methods, and devices formed by the methods have a number of advantages. Embodiments are shown that include cleaning using a supercritical fluid. Advantages include a combination of both chemical and mechanical removal abilities from the supercritical fluid. Mechanical energy for cleaning is transmitted in a homogenous manner throughout a carrier fluid. The mechanical energy provided in methods shown can also be used with delicate surface features.

REFERENCES:
patent: 4817652 (1989-04-01), Liu
patent: 4944837 (1990-07-01), Nishikawa et al.
patent: 4962776 (1990-10-01), Liu et al.
patent: 5013366 (1991-05-01), Jackson et al.
patent: 5185296 (1993-02-01), Morita et al.
patent: 5304515 (1994-04-01), Morita et al.
patent: 5456759 (1995-10-01), Stanford, Jr. et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6071439 (2000-06-01), Bawa et al.
patent: 6149828 (2000-11-01), Vaartstra
patent: 6242165 (2001-06-01), Vaartstra
patent: 6306754 (2001-10-01), Agarwal
patent: 6558475 (2003-05-01), Jur et al.
patent: 6666986 (2003-12-01), Vaartstra
patent: 6800142 (2004-10-01), Tipton et al.
patent: 7064070 (2006-06-01), Mullee et al.
patent: 7303637 (2007-12-01), Farrar
patent: 2003/0116176 (2003-06-01), Rothman et al.
patent: 2003/0228738 (2003-12-01), Beaudoin
patent: 2004/0211440 (2004-10-01), Wang et al.
patent: 2005/0076935 (2005-04-01), Farrar
patent: 2006/0289033 (2006-12-01), Farrar
Wolf, S. , et al., “Chpt 15 “Wet Processing: Cleaning, Etching and Liftoff””,Silicon Processing for the VLSI Era, vol. 1—Process Technology, Lattice Press, Snset Beach, CA, (1986),514-520.

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