Photosensitive resin composition for color filter

Details Photosensitive resin composition for color filter Photosensitive resin composition for color filter

1996-05-24

1999-03-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03F 7023

Patent

active

058768955

ABSTRACT:
A photosenstive resin composition for color filter having excellent resolution, heat resistance and transparency, etc., characterized in that it contains a novolak resin having the recurring units such as those represented by the general formula (I): ##STR1## and R.sub.7 represent hydrogen, alkyl, etc., provided that ##STR2## is coordinated at the o- or p-position in relation to the --OH group! and having a molecular weight of about 1,000-50,000, a solvent and a dye or pigment.

REFERENCES:
patent: 3288864 (1966-11-01), Farnham
patent: 4268648 (1981-05-01), Freitag et al.
patent: 4366328 (1982-12-01), Numata et al.
patent: 4387152 (1983-06-01), Stahlhofen
patent: 4889788 (1989-12-01), Stahlhofen et al.
patent: 4929536 (1990-05-01), Spak et al.
patent: 5130225 (1992-07-01), Uetomi
patent: 5304456 (1994-04-01), Ueda et al.
patent: 5397679 (1995-03-01), Ueda et al.

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