Noise-reduction metrology models

Details Noise-reduction metrology models Noise-reduction metrology models

2008-01-22

2010-06-22

Punnoose, Roy (Department: 2886)

Optics: measuring and testing

Dimension

Reexamination Certificate

active

07742177

ABSTRACT:
The invention can provide apparatus and methods for processing wafers using Noise-Reduction (N-R) metrology models that can be used in Double-Patterning (D-P) processing sequences, Double-Exposure (D-E) processing sequences, or other processing sequences.

REFERENCES:
patent: 5340992 (1994-08-01), Matsugu et al.

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