Method and apparatus for scanning a laser beam to examine the su

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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350 67, H01J 314

Patent

active

048002682

ABSTRACT:
An apparatus for scanning a laser beam to examine the surface of a semiconductor wafer comprises a stage onto which a semiconductor wafer is mounted and a laser beam scanning unit for repeatedly rectilinearly scanning a laser beam in a predetermined direction on the semiconductor wafer. This scanning apparatus further has a drive unit for rotating the semiconductor wafer and for moving the semiconductor wafer by only a predetermined distance in the predetermined direction every rotation of the wafer. The laser beam scanning unit rectilinearly scans the laser beam at a swing width of a predetermined amount.

REFERENCES:
patent: 4367952 (1983-01-01), Ahrens et al.
patent: 4539481 (1985-09-01), Troukens et al.
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4682037 (1987-07-01), Kosugi
patent: 4710029 (1987-12-01), Katoh

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