Plasma generating electrode and plasma reactor

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

Reexamination Certificate

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C422S186000, C204S164000

Reexamination Certificate

active

07727488

ABSTRACT:
A plasma generating electrode1of the present invention includes two or more electrodes2disposed to face each other, and holding members3for holding electrodes2at a predetermined interval, and can generate plasma by applying voltage between electrodes2. At least one of electrodes facing each other2has a plate-shaped ceramic body6serving as a dielectric body, and a conductive film7disposed inside the body6, and the holding members3fix the opposite side end portions5(fixed end portions5a) of electrodes facing each other2in the state of a cantilever in such a condition that electrodes2are held by holding members in the state of cantilevers of the different directions alternately at a predetermined interval as a whole. This relaxes the thermal stress and effectively prevents distortion and breakage of electrodes caused by to a temperature change.

REFERENCES:
patent: 4472174 (1984-09-01), Chuan
patent: 6146599 (2000-11-01), Ruan et al.
patent: 6576202 (2003-06-01), Chiu
patent: 6596243 (2003-07-01), Fujii et al.
patent: 6887440 (2005-05-01), Nelson et al.
patent: 2002/0076363 (2002-06-01), Nelson et al.
patent: 2002/0131916 (2002-09-01), Nelson et al.
patent: A 1-163413 (1989-06-01), None
patent: A 2001-164925 (2001-06-01), None
patent: A 2002-256851 (2002-09-01), None
patent: A 2002-256853 (2002-09-01), None
patent: WO 99/47242 (1999-09-01), None
U.S. Appl. No. 10/561,840, filed Dec. 22, 2005, Miyairi et al.
U.S. Appl. No. 10/561,841, filed Dec. 22, 2005, Miyairi et al.
U.S. Appl. No. 10/562,597, filed Dec. 21, 2005, Miyairi et al.

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