Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-08-14
2010-12-28
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S030000, C430S311000, C250S311000
Reexamination Certificate
active
07858271
ABSTRACT:
A method of measuring dimension of a first pattern with a narrow first width, and a second pattern with a second width wider than the first width of the first pattern and formed in a symmetrical appearance with respect to a center of the second pattern, the second pattern having edges opposed to each other defining the second width, includes a step of forming a pair of first dummy patterns each having a narrow width, the pair of first dummy patterns being spaced from the edges of the second pattern respectively by a distance approximate to the first width of the first pattern, a first measurement step of measuring, using a dimension measuring device, a spaced distance of one of the first dummy patterns from the edge of the second pattern and a width of the one of the first dummy patterns within the same field of view of the dimension measuring device, a second measurement step of measuring, using the dimension measuring device, a width of the first pattern under the same measurement condition as that of the first measurement step, and a calculation step of calculating a width of the second pattern from WB=2DA+WD+DC, where WBis the calculated width of the second pattern, DCis a design value of a distance between the centers of the pair of first dummy patterns, DAis a measured spaced distance of the one of the first dummy patterns from the edge of the second pattern, and WDis a measured width of the one of the first dummy patterns.
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Hiraki Tetsuya
Ohta Naoki
Tanaka Yoshiaki
Huff Mark F
Oliff & Berridg,e PLC
Ruggles John
TDK Corporation
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