Image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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Details

C257S226000, C257S227000, C257S258000, C257S293000, C257SE31079, C257SE31084, C257SE31083

Reexamination Certificate

active

07838955

ABSTRACT:
An image sensor includes a metal interconnection and readout circuitry over a first substrate, an image sensing device, and an ion implantation isolation layer. The image sensing device is over the metal interconnection, and an ion implantation isolation layer is in the image sensing device. The image sensing device includes first, second and third color image sensing units, and ion implantation contact layers. The first, second and third color image sensing units are stacked in or on a second substrate. The ion implantation contact layers are electrically connected to the first, second and third color image sensing units, respectively.

REFERENCES:
patent: 6852565 (2005-02-01), Zhao
patent: 6930336 (2005-08-01), Merrill
patent: 6960757 (2005-11-01), Merrill et al.
patent: 7544560 (2009-06-01), Noh
patent: 1820349 (2006-08-01), None
patent: 1957599 (2007-05-01), None
patent: 1 10-2005-0117674 (2005-12-01), None
patent: 10-0889365 (2005-12-01), None
patent: 10-2007-0019452 (2007-02-01), None
patent: 2005/120048 (2005-12-01), None
Sang Yun Lee; “Image Sensor of Three-Dimensional Structure Using Depletion Region for Improving Yield and Manufacturing Method Thereof”; Abstract for Patent Publication No. 1020050117674 A; Publication Date: Dec. 15, 2005; Korean Intellectual Property Office; Republic of Korea.
Korean Office Action dated Feb. 26, 2008; Korean Patent Application No. 10-2007-0139747; Korean Intellectual Property Office, Republic of Korea.
Hyun Pil Noh; “Image Sensor Using Charge Flow Preventing Region and Manufacturing Method Thereof”; Korean Patent Abstracts; Publication No. 1020070019452 A; Publication Date: Feb. 15, 2007; Korean Intellectual Property Office, The Republic of Korea.
Sang Yun Lee; “3-Dimensional Solid-State Image Sensor and Method of Making the Same”; espacenet—Bibliographic data; Publication No. KR100889365 (B1); Publication Date: Dec. 15, 2005; espacenet Database—Worldwide.
James Merrill and Richard B Hanneb; “Simplified Wiring Schemes for Vertical Color Filter Pixel Sensors”; espacenet; Chinese Publication No. CN1957599 (A); Publication Date: May 2, 2007; espacenet Database—Worldwide.
Zhao Linxin; “An Image Sensor with a Vertical Overflow Drain and Short Micro-Lens to Silicon Distance”; espacenet; Chinese Publication No. CN1820349 (A); Publication Date: Aug. 16, 2006; espacenet Database—Worldwide.
English Translation of Chinese Office Action dated Feb. 5, 2010; Chinese Patent Application No. 200810189137.0; 2 pages; The State Intellectual Property Office of P.R.C., The People's Republic of China.
Korean Office Action dated Aug. 26, 2008; Korean Patent Application No. 10-2008-0062717; 6 pages; Korean Intellectual Property Office, The Republic of Korea.

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