Method of forming fine pattern, liquid crystal device having...

Details Method of forming fine pattern, liquid crystal device having... Method of forming fine pattern, liquid crystal device having...

2006-06-23

2010-06-15

Nguyen, Dung (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S141000, C216S023000

Reexamination Certificate

active

07738071

ABSTRACT:
This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.

REFERENCES:
patent: 5162933 (1992-11-01), Kakuda et al.
patent: 5317433 (1994-05-01), Miyawaki et al.
patent: 5339181 (1994-08-01), Kim et al.
patent: 5462887 (1995-10-01), Gluck
patent: 5668379 (1997-09-01), Ono et al.
patent: 5731856 (1998-03-01), Kim et al.
patent: 5771083 (1998-06-01), Fujihara et al.
patent: 5793460 (1998-08-01), Yang
patent: 5847781 (1998-12-01), Ono et al.
patent: 6632709 (2003-10-01), Ayres et al.
patent: 6682658 (2004-01-01), Ahn et al.
patent: 6762813 (2004-07-01), Zhang et al.
patent: 6765642 (2004-07-01), Lee
patent: 6784966 (2004-08-01), Maeda et al.
patent: 6914039 (2005-07-01), Ishikawa et al.
patent: 2002/0017665 (2002-02-01), Lyu et al.
patent: 2003/0049876 (2003-03-01), Mori et al.
patent: 2003/0107023 (2003-06-01), Chae et al.
patent: 2003/0184688 (2003-10-01), Kim
patent: 2004/0027524 (2004-02-01), Shiota et al.
patent: 2005/0007535 (2005-01-01), Hirakata et al.
patent: 2006/0063369 (2006-03-01), Lu et al.
patent: 2007/0001961 (2007-01-01), Yoo et al.

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