Suppression of particle generation in a modified clean room coro

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

361231, 361230, 250324, B01J 1908, H01T 2300, H05F 300

Patent

active

051165830

ABSTRACT:
A clean non-hydrogen-containing dry gas flows through the corona points of a clean room corona air ionizer in order to suppress the generation of particles.

REFERENCES:
patent: 4424549 (1984-01-01), Ensing
patent: 4665462 (1987-05-01), Blitshteyn et al.
K. Dillenbeck, "Selection of Air Ionization Within the Cleanroom", Proc. 32nd Annual Tech Mtg of the IES, pp. 387-392.
R. P. Donovan et al., "The Dependence of Particle Deposition Velocity on Surface Potential" 1987 Proc. of the IES, pp. 473-478.
B. Y. H. Liu et al., "Aerosol Charging and Neutralization and Electrostatic Discharge in Clean Rooms" J. Envir. Sci. Mar./Apr. 1987, pp. 42-46.
M. Suzuki et al., "Effectiveness of Air Ionization Systems in Clean Rooms" Proc. 34th Annual Tech. Mtg. of the IES (1988) pp. 405-412.
K. Murray et al., "Ozone and Small Particle Production by Steady State DC Hood Ionization: An Evaluation" 1989 EOS/ESD Symposium Proc. pp. 18-22.
K. D. Murray et al., "Hood Ionization in Semiconductor Wafer Processing: An Evaluation" 1988 EOS/ESD Symposium Proc. pp. 195-200.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Suppression of particle generation in a modified clean room coro does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Suppression of particle generation in a modified clean room coro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Suppression of particle generation in a modified clean room coro will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-418068

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.