Semiconductor storage device and method of manufacturing the...

Static information storage and retrieval – Floating gate – Particular biasing

Reexamination Certificate

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Details

C365S185240, C257S392000, C257S547000

Reexamination Certificate

active

07859905

ABSTRACT:
A method of manufacturing a semiconductor storage device according to an embodiment of the present invention includes forming dummy cells 611, to 618at a position adjacent to a reference cell 412, and implanting an impurity into the dummy cells 611, to 618using a mask that covers the reference cell 412. Here, the process of implanting the impurity is carried out so that the impurity exudes out of the dummy cells 611, to 618to the reference cell 412.

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