Illumination optical system, exposure method and designing...

Details Illumination optical system, exposure method and designing... Illumination optical system, exposure method and designing...

2006-12-15

2010-12-07

Mathews, Alan A (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

07847918

ABSTRACT:
Exposure for performing patterning in which micropatterns differing in pitch exist in close vicinity to one another is handled, and micropatterns are formed with high accuracy with sufficient manufacture process margins without using a photomask complicated in manufacturing process at high manufacture cost like an alternating phase shift mask. A light intensity distribution of irradiation light constituted of double pole illuminations is formed to correspond to L&S patterns. The double pole illumination is constituted of a pair of illumination modes, and the double pole illumination is constituted of a pair of illumination modes.

REFERENCES:
patent: 6855486 (2005-02-01), Finders et al.
patent: 2002/0172872 (2002-11-01), Hoshino
patent: 2004/0156030 (2004-08-01), Hansen
patent: 2006/0126046 (2006-06-01), Hansen
patent: 2001-126983 (2001-05-01), None

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