Structure and method for determining an overlay accuracy

Details Structure and method for determining an overlay accuracy Structure and method for determining an overlay accuracy

2008-04-11

2010-02-23

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000, C257S048000, C257S618000, C257S797000, C438S975000

Reexamination Certificate

active

07666559

ABSTRACT:
An enhanced technique for determination of an alignment accuracy involves an overlay target assembly which comprises at least two targets, each target having a first sub-structure of a first layer and a second sub-structure of a second layer, wherein, when the first layer and the second layer are correctly aligned, the first sub-structure and the second sub-structure of at least one of the targets are offset with respect to each other by a programmed offset and the overlay target assembly is invariant to at least one geometric transformation. If the offset vectors which describe the offset between the first sub-structure and the second sub-structure all have the same norm, the overlay error may be determined without calibration. Redundancy may be increased by providing each target with two or more programmed offsets between elements of the first sub-structure and elements of the second sub-structure.

REFERENCES:
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patent: 2007/0008533 (2007-01-01), Ghinovker
patent: 2007/0058169 (2007-03-01), Ausschnitt et al.
patent: 2007/0096094 (2007-05-01), Levinski et al.
patent: 2004252313 (2004-09-01), None
Translation of Official Communication from German Patent Office for German Patent Application No. 10 2007 046 850.6 dated Jul. 31, 2008.

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