High temperature, stable SiC device interconnects and...

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S772000, C257SE23020

Reexamination Certificate

active

07659614

ABSTRACT:
A method of forming packages containing SiC or other semiconductor devices bonded to other components or conductive surfaces utilizing transient liquid phase (TLP) bonding to create high temperature melting point bonds using in situ formed ternary or quaternary mixtures of conductive metals and the devices created using TLP bonds of ternary or quaternary materials. The compositions meet the conflicting requirements of an interconnect or joint that can be exposed to high temperature, and is thermally and electrically conductive, void and creep resistant, corrosion resistant, and reliable upon temperature and power cycling.

REFERENCES:
patent: 3678570 (1972-07-01), Paulonis et al.
patent: 3753794 (1973-08-01), Paulonis et al.
patent: 3935986 (1976-02-01), Lattari et al.
patent: 4988035 (1991-01-01), Ueno et al.
patent: 5038996 (1991-08-01), Wilcox et al.
patent: 5432998 (1995-07-01), Galasco et al.
patent: 5759737 (1998-06-01), Feilchenfeld et al.
patent: 5897341 (1999-04-01), Love et al.
patent: 5985692 (1999-11-01), Poenisch et al.
patent: 6066808 (2000-05-01), Kresge et al.
patent: 6330967 (2001-12-01), Milewski et al.
patent: 6429388 (2002-08-01), Interrante et al.
patent: 6550665 (2003-04-01), Parrish et al.
patent: 6555762 (2003-04-01), Appelt et al.
patent: 2002/0090756 (2002-07-01), Tago et al.
patent: 2002/0171157 (2002-11-01), Soga et al.
patent: 2004/0050912 (2004-03-01), Spencer
patent: 2005/0072835 (2005-04-01), Choi et al.
patent: 4303790 (1994-08-01), None
patent: 19532251 (1997-03-01), None
patent: 0365807 (1990-05-01), None
patent: 221023 (2004-09-01), None
International Search Report for PCT/US2006/000090 mailed Oct. 27, 2006.
Campbell, et al., “Materials Science and Engineering Laboratory National Institute of Standards & Technology”, Metallurgy Division Annual Report 1998.
Johnson, “Current state-of-the-art and future prospects for power semiconductor devices in power transmission & distribution applications”, Intern.Journal Elect., V90, 2003.
Search Report ROC 095100689, Jan. 26, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High temperature, stable SiC device interconnects and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High temperature, stable SiC device interconnects and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High temperature, stable SiC device interconnects and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4168228

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.