Electrophotography – Image formation – Development
Reexamination Certificate
2007-11-30
2010-06-08
Chen, Sophia S (Department: 2852)
Electrophotography
Image formation
Development
C399S113000
Reexamination Certificate
active
07734226
ABSTRACT:
The present application is directed to devices and methods to position a developer member relative to a photoconductive member in an image forming device. One embodiment includes an elongated lift plate positioned in proximity to a photoconductive member. An elongated opening may be positioned within the lift plate. The opening may include a first section and a second section. The first section may be positioned farther from the photoconductive member than the second section. A positioning member may be positioned within the opening, and be operatively connected to the developer member. A hold down may bias the positioning member towards an edge of the opening. The lift plate may be longitudinally movable between a first position with the positioning member in the first section of the opening that positions the developer member away from the photoconductive member, and a second position with the positioning member in the second section that positions the developer member against the photoconductive member.
REFERENCES:
patent: 4851873 (1989-07-01), Sakao et al.
patent: 5089849 (1992-02-01), Hiraoka
patent: 7509071 (2009-03-01), Yoshimura et al.
patent: 2007/0217816 (2007-09-01), Shiraki
Agnissey Kevin
Boettcher Brian
Greywall Shaun S.
Horrall Paul Douglas
Newman Robert Galon
Chen Sophia S
Lexmark International Inc.
LandOfFree
Lift mechanism for one or more developer members in an image... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lift mechanism for one or more developer members in an image..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lift mechanism for one or more developer members in an image... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4166553