Heat treatment apparatus and methods for thermally...

Details Heat treatment apparatus and methods for thermally... Heat treatment apparatus and methods for thermally...

2007-03-30

2010-02-23

Mathews, Alan A (Department: 2882)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C430S330000, C118S733000

Reexamination Certificate

active

07665917

ABSTRACT:
Apparatus and methods for heating a substrate in a pressurized environment inside of a thermal processing system. The substrate is placed in a gaseous environment inside a processing chamber of the thermal processing system. The substrate is supported in the gaseous environment. The gas pressure inside the processing chamber is increased above atmospheric pressure, which increases the temperature of the gaseous environment. Heat is transferred from the pressurized gaseous environment to the substrate for thermally processing a layer on the substrate.

REFERENCES:
patent: 5350899 (1994-09-01), Ishikawa et al.
patent: 6112595 (2000-09-01), Stanke et al.
patent: 6229116 (2001-05-01), Shirakawa et al.
patent: 6345909 (2002-02-01), Yam
patent: 6575622 (2003-06-01), Norrbakhsh et al.
patent: 6597964 (2003-07-01), Huang et al.
patent: 6921456 (2005-07-01), Biberger et al.
patent: 2008/0160462 (2008-07-01), Herchen et al.
patent: 04319723 (1992-11-01), None
patent: 20070051646 (2007-05-01), None
“Supercritical Fluid”, downloaded from http://en.wikipedia.org/wiki/Supercritical—fluid on Sep. 23, 2009.
Gail Kaplan Verbitsky, Examiner, USPTO, Office Action issued in related U.S. Appl. No. 11/833,038 dated as mailed Jul. 10, 2009.

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