Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-12-20
2010-02-02
Desire, Gregory M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C356S237400, C356S237500, C382S149000, C382S218000
Reexamination Certificate
active
07657078
ABSTRACT:
An apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function of judging criticality or non-flat state of the defect by use of the estimation result. It becomes possible to establish both of a high-throughput image collecting sequence in which any reference image is not acquired and high-precision defect classification, and then to realize both of a high performance classifying function and a high-throughput image collecting function in a defect reviewing apparatus which automatically collects and classifies images of defects existing on a sample of a semiconductor wafer or the like.
REFERENCES:
patent: 6407373 (2002-06-01), Dotan
patent: 6483938 (2002-11-01), Hennessey et al.
patent: 6605478 (2003-08-01), Pnueli et al.
patent: 7103505 (2006-09-01), Teshima et al.
patent: 7127099 (2006-10-01), Noy
patent: 7242467 (2007-07-01), Wienecke
patent: 7440606 (2008-10-01), Sanda
patent: 7526119 (2009-04-01), Isomura et al.
patent: 2001/0042705 (2001-11-01), Nakagaki et al.
patent: 2002/0113234 (2002-08-01), Okuda et al.
patent: 2003/0050761 (2003-03-01), Okabe et al.
patent: 2005/0226494 (2005-10-01), Yamamoto et al.
patent: 2006/0082763 (2006-04-01), Teh et al.
patent: 2009/0123060 (2009-05-01), Liu et al.
patent: 2001-331784 (2001-11-01), None
patent: 2003-98114 (2003-04-01), None
Honda Toshifumi
Nakagaki Ryo
Antonelli, Terry Stout & Kraus, LLP.
Desire Gregory M
Hitachi High-Technologies Corporation
LandOfFree
Method and apparatus for reviewing defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for reviewing defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for reviewing defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4162251