Plasma processing apparatus with dielectric plates and...

Details Plasma processing apparatus with dielectric plates and... Plasma processing apparatus with dielectric plates and...

Filed on

2005-10-27

Date issued

2010-06-01

Examiner

Ralis, Stephen J (Department: 3742)

Patent Class

Electric heating

SubClass

Metal heating

SubSubClass

By arc

Other Related Categories

C219S121400, C219S121360, C118S7230MW, C315S111410, C156S345410, C204S298380

Type

Reexamination Certificate

Status

active

Patent number

07728251

Description

ABSTRACT:
In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.

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