Method and apparatus for reviewing defects by detecting...

Details Method and apparatus for reviewing defects by detecting... Method and apparatus for reviewing defects by detecting...

2008-10-16

2010-02-02

Nguyen, Ha Tran (Department: 2829)

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

Reexamination Certificate

active

07656171

ABSTRACT:
A method and apparatus for detecting defects includes irradiating and scanning an electron beam focused on an area of a sample, detecting charged particles generated from the sample by the irradiating and scanning of the electron beam with a first detector which detects charged particles having relatively low energy to obtain a first image of the area and with a second detector which detects charged particles having relatively high energy to obtain a second image of the area, comparing the first inspection image of the area with a first reference image to generate a first difference image, and comparing obtained second image of the area with a second reference image to generate a second difference image, and detecting an open defect or a short defect from at least one of the generated first difference image and the second difference image.

REFERENCES:
patent: 6476388 (2002-11-01), Nakagaki
patent: 6642726 (2003-11-01), Weiner
patent: 6650129 (2003-11-01), Katayama
patent: 7012439 (2006-03-01), Pinto et al.
patent: 2001/0052781 (2001-12-01), Nozoe et al.
patent: 2002/0149381 (2002-10-01), Lo
patent: 2003/0210062 (2003-11-01), Katayama
patent: 2004/0207414 (2004-10-01), Verma
patent: 10-135288 (1998-05-01), None
patent: 2003-098114 (2003-04-01), None

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