Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-08-01
2010-11-02
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S296000, C250S492200
Reexamination Certificate
active
07824825
ABSTRACT:
The present invention presents a stencil mask in which various surface patterns can be formed, and in which deformation is suppressed when charged particles are introduced. A stencil mask of the present invention is provided with a semiconductor stack. A first penetrating hole corresponding to an ion introducing area is formed in a first semiconductor layer of the semiconductor stack, and second penetrating holes are formed in a second semiconductor layer, these second penetrating holes having a width greater than the width of the first penetrating hole. The first penetrating hole and the second penetrating holes communicate and pass through the semiconductor stack. Beam members extending between adjacent second penetrating holes connect portions of the first semiconductor layer separated by the first penetrating hole.
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Notification of Reasons for Rejection for JP Appl. No. 2005-225453 dated Aug. 3, 2010.
Nishiwaki Tsuyoshi
Tojima Hideki
Finnegan Henderson Farabow Garrett & Dunner LLP
Jelsma Jonathan
Rosasco Stephen
Toyota Jidosha & Kabushiki Kaisha
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