Coating processes – Coating by vapor – gas – or smoke – Moving the base
Reexamination Certificate
2005-12-08
2009-06-30
Culbert, Roberts P (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Moving the base
Reexamination Certificate
active
07553518
ABSTRACT:
A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at least a portion of the dummy substrates being loaded into the reaction chamber together with the process substrates through the use of the boat. A substrate cleaning process is carried out by loading dummy substrates to be cleaned into the reaction chamber through the use of the boat and introducing a cleaning gas into the reaction chamber.
REFERENCES:
patent: 5112641 (1992-05-01), Harada et al.
patent: 5248886 (1993-09-01), Asakawa et al.
patent: 5683513 (1997-11-01), Fujimaki
patent: 5858103 (1999-01-01), Nakajima et al.
patent: 6238488 (2001-05-01), Fujita et al.
patent: 6301802 (2001-10-01), Kato et al.
patent: 7003219 (2006-02-01), Tometsuka
patent: 05283306 (1993-10-01), None
Bacon & Thomas PLLC
Culbert Roberts P
Hitachi Kokusai Electric Inc.
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