Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2007-10-16
2009-06-23
Hasan, Mohammed (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C359S726000
Reexamination Certificate
active
07551362
ABSTRACT:
An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5825043 (1998-10-01), Suwa
patent: 5852490 (1998-12-01), Matsuyama
patent: 5900354 (1999-05-01), Batchelder
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 6166865 (2000-12-01), Matsuyama
patent: 6191429 (2001-02-01), Suwa
patent: 6198576 (2001-03-01), Matsuyama
patent: 6961186 (2005-11-01), Pierrat et al.
patent: 7317507 (2008-01-01), Straaijer
patent: 7414794 (2008-08-01), Novak
patent: 2001/0040722 (2001-11-01), Shafer et al.
patent: 2003/0004757 (2003-01-01), Haines
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2005/0018164 (2005-01-01), Hansen
patent: 2005/0068499 (2005-03-01), Dodoc et al.
patent: 2005/0094119 (2005-05-01), Loopstra et al.
patent: 2006/0028630 (2006-02-01), Akimoto
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 023 231 (1981-02-01), None
patent: 0 605 103 (1994-07-01), None
patent: 0 834 773 (1998-04-01), None
patent: 1 115 019 (2001-07-01), None
patent: A-2002-244035 (2002-08-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/107048 (2004-12-01), None
Kawata et al; “Fabrication of 0.2 μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens”; Jpn. J. Appl. Phys. vol. 31 (1992) pp. 4174-4177; Part 1, No. 128, Dec. 1992.
Feuer et al; “Projection Photolithography-Liftoff Techniques for Production of 0.2 μm Metal Patterns”; IEEE Transactions On Electron Devices, vol. 28, No. 11, pp. 1375-1378, Nov. 1981.
Baek et al; “Simulation Study of Process Latitude for Liquid Immersion Lithography”; Optical Microlithography XVI, vol. 5040 (2003), pp. 1620-1630.
Hafeman et al; “Simulation of imaging and stray light effects in immersion lithography”; Optical Microlithography XVI, vol. 5040 (2003), pp. 700-712.
Kawata et al; “Optical Projection Lithography Using Lenses with Numerical Apertures Great than Unity”; Microelectronic Engineering 9 (1989), pp. 31-36.
Owa et al; “Immersion Lithography; its potential performance and issues”; Optical Microlithography XVI, vol. 5040 (2003), pp. 724-733.
Owen et al; “⅛ μm optical lithography”; J. Vac. Sci. Technol. B 10(6), Nov./Dec. 1992, pp. 3032-3036.
Smith et al; “Water Immersion Optical Lithography for the 45nm Node”; Optical Microlithography XVI, vol. 5040 (2003), pp. 679-689.
Switkes et al; “Resolution enhancement of 157 nm lithography by liquid immersion”; JM31(3), Oct. 2002, pp. 225-228.
Ulrich et al; “The Development of Dioptric Projection Lenses for DUV Lithography”; International Optical Design Conference 2002, vol. 4832 (2002), pp. 158-169.
Ikezawa Hironori
Omura Yasuhiro
Hasan Mohammed
Nikon Corporation
Oliff & Berridg,e PLC
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