Filter exposure apparatus, and device manufacturing method

Details Filter exposure apparatus, and device manufacturing method Filter exposure apparatus, and device manufacturing method

2006-07-11

2009-12-15

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S005000

Reexamination Certificate

active

07633598

ABSTRACT:
A filter used for an exposure apparatus that exposes a plate using a light from a light source includes a light transmitting film configured to transmit the light from the light source, a first rod member that includes plural first rod members, and thermally contacts the light transmitting film, the plural second rod members being rod members and including a second rod member; and a second member that includes plural second rod members, and thermally contacts the light transmitting film and/or the first member, the plural second rod members being other rod members including a second rod member, wherein a heating value transmittable by the first rod member per unit time in a longitudinal direction of the first rod member is smaller than a heating value transmittable by the second rod member per unit time in a longitudinal direction of the second rod member.

REFERENCES:
patent: 6522465 (2003-02-01), Goldstein
patent: 2004/0061930 (2004-04-01), Wedowski
patent: 2006/0160031 (2006-07-01), Wurm et al.
patent: 2000-89000 (2000-03-01), None
patent: 2004103773 (2004-04-01), None
English translation of the Patent Publication of 2004103773 (Kondo Hiroyuki) is attached.
Booth, et al, High-resolution EUV imaging tools for resist exposure and aerial image monitoring<Proceedings of SPIE, vol. 5751, May 2005, pp. 78-89.
Extended European Search Report issued in corresponding European Patent Application No. 06116973.6 dated Jul. 20, 2009.
Booth, M. et al., “High-resolution EUV imaging tools for resist exposure and aerial image monitoring”, Proceedings of the SPIE, vol. 5751, No. 1, Mar. 3, 2005, pp. 97-108. Cited in EESR issued in corres. EP 06116973.6 dated Jul. 20, 2009; see NPL cite No. 1.
Powell, Forbes R. et al., “Filter windows for EUV lithography”, Proceedings of the SPIE, vol. 4343, Jan. 1, 2001, pp. 585-589. Cited in EESR issued in corres. EP 06116973.6 dated Jul. 20, 2009; see NPL cite No. 1.

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