Vacuum depositing apparatus

Details Vacuum depositing apparatus Vacuum depositing apparatus

1988-12-05

1991-04-16

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

118719, 118726, 156610, 156611, 4272481, C23C 1600

Patent

active

050073729

ABSTRACT:
A vacuum depositing apparatus for forming a vapor-deposited film by evaporation of a material to be vapor deposited onto the surface of a substrate under vacuum, whereby mechanisms are provided to prevent impurities, due to contamination in the vacuum vessel or impurities caused by thermal deterioration of the material, from mixing with and contaminating the vapor-deposited film. As a mechanism for preventing impurities from mixing into the vapor-deposited film, there is provided a collimator, preferably cooled to prevent re-evaporation of the material to be vapor-deposited, once it is diffused into the vacuum vessel, and to prevent subsequent mixture of this material with the vapor deposited film, or a separation mechanism such as a valve provided between the substrate and the spouting cell to prevent contamination of the vapor-deposited film between the substrates and the spouting cell, or there is provided a spouting cell containing a specimen container unsealing mechanism, operable under a vacuum, which unsealing mechanism permits a gas to be introduced from the specimen container into the spouting cell.

REFERENCES:
patent: 4606296 (1986-08-01), Gailliard et al.
Tsang, W. T., "Chemical Beam Epitaxy of InP and GaAs", Applied Physics Letters, vol. 45, No. 11 (Dec. 1, 1984), pp. 1234-1236.

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